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Glass/Wafer Substrate Cleaner PK-LCG Series
Glass/Wafer Substrate Cleaner Contents
Applicable for LT, LN wafer or stainless steel used for semiconductors, solarcells, MEMS, etc.
Works well for removing cushioning paper, film adhesive, cullet, adrasives, fingerprints, particles, residual resist, organic materials and liquid crystal material.
Stain and cleaner can easily be rinsed out.
An extensive lineup of typical products including special cleaner for aluminium,
low COD types, low foaming types, and non-phosphorous types.
low COD types, low foaming types, and non-phosphorous types.
【Inorganic Cleaner】 PK-LCG Series
Products Name | Type | Features |
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PK-LCG23 | Alkali | Standard type. |
PK-LCG25 | Alkali |
Non foaming type. Good rinsing properties. |
PK-LCG213K | Alkali |
Works very well for removing abrasives such as Cerium oxides. |
PK-LCG221 | Alkali |
Low foaming type. |
PK-LCG227 | Alkali | Effective for removing stain caused by cushioning paper or other buffering agents and materials. |
【Organic Cleaner】 PK-LCG Series
Products Name | Type | Features |
---|---|---|
PK-LCG44S | Alkali |
Metal free standard type. Can be used for TFTs. |
PK-LCG54 | Alkali |
Has excellent flux removal performance. Good rinsing properties. |
PK-LCG47N | Neutral |
Neutral standard type. |
PK-LCG451N | Neutral | A neutral and low fow foaming type with added cleaning power suited for aluminium substrate. |
PK-LCG473N | Neutral | Suited for alminum substrates. Effective for removing persistent stain especially made of organic materials. |
PK-LCG488A | Acid | An acid type suited for removing adhesive sheets. Effective for removing abrasives, such as serium oxide, etc. |
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Finger mark stain
↓ Cushioning materials stain
↓Adhesive stain
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After cleaning
After cleaning
After cleaning